99.99% SiO2, >92% 광 투과율, 1732℃ 융점 및 1150℃ 작동 온도를 갖춘 고순도 용융 실리카 플레이트입니다. 펀칭/절단 옵션이 있는 맞춤형 크기(직경 1~800mm, 두께 0.2~100mm). 반도체, 레이저 및 광학 응용 분야를 위한 JGS 표준, 내식성, 고온 내구성.
High Temperature Resistant JGS1 JGS2 JGS3 Clear Fused Silica Quartz Glass Wafer for Semiconductor Manufacturing High purity 99.99% high temperature resistant, corrosion resistant quartz glass rectangle square sheet. Customized corrosion resistant and high temperature resistant quartz frosted plates ...
High Temperature Resistant Fused Silica Quartz Coated Plate High purity 99.99% high temperature resistant, corrosion resistant quartz glass rectangle square sheet. Customized corrosion resistant and high temperature resistant quartz frosted plates manufactured by Shengfan Quartz. Technical ...
High Temperature Resistant Clear Quartz Glass Tube No Bubbles Fused Silica Pipe for Semiconductor Diffusion Furnace Product Characteristics SiO₂ Content 99.9% Density 2.2 g/cm³ Hardness (Moh's Scale) 6.6 Melting Point 1732℃ Working Temperature 1100℃ Max Short-term Temperature 1450℃ Visible Light ...